Gadolinium Nickel (Gd-Ni) sputtering target is a rare earth alloy target composed typically of Gadolinium (Gd) and Nickel (Ni) in controlled stoichiometric ratios. This target material is widely used in the production of thin films via magnetron sputtering, especially in magnetic, optical, and spintronic applications.
Material Composition: Gadolinium and Nickel
Purity: Up to 99.9% or higher depending on requirements
Forms Available: Planar target, rotary target, custom sizes
Structure: Homogeneous microstructure, fine grain
Magnetic Behavior: Exhibits ferromagnetic and paramagnetic characteristics
Magnetic Thin Films
GdNi targets are ideal for fabricating multilayer magnetic films in hard drives, magnetic sensors, and spintronics.
Optical Coatings
Due to Gadolinium’s unique electronic structure, this alloy target is useful in developing functional coatings for UV and IR filters.
Data Storage
Thin films produced from GdNi targets contribute to high-density data storage and memory media.
Materials Research
It is also widely used in academic and industrial R&D for studying rare earth-transition metal interactions and magnetic phase transitions.
At [Your Company Name], we manufacture Gadolinium Nickel sputtering targets with precise stoichiometry (commonly Gd:Ni = 1:1 or customized), high purity, and excellent density. Our targets are produced via vacuum melting, followed by precise machining to ensure uniform thickness and optimal performance in sputtering systems.
Looking for high-quality Gadolinium Nickel targets for your next deposition project? Contact us today for specifications, pricing, and technical support. Custom compositions and dimensions are available upon request.
Please feel free to contact us. You can get in touch with us in the following ways:
Tel: +86 15575172860
Email: [email protected]
Website: xk-ree.com
Liuyang Xinkang looks forward to working with you to jointly promote the innovation and development of rare earth target technology and contribute to the progress of high-tech industries.
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